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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Novel metal containing resists for EUV lithography extendibility

Panning, Eric M., Goldberg, Kenneth A., De Simone, Danilo, Sayan, Safak, Dei, Satoshi, Pollentier, Ivan, Kuwahara, Yuhei, Vandenberghe, Geert, Nafus, Kathleen, Shiratani, Motohiro, Nakagawa, Hisashi,

Year:

2016

Language:

english

File:

PDF, 1.28 MB

english, 2016

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Relationship between resist outgassing and EUV witness sample contamination in NXE outgas qualification using electrons and EUV photons

Wood, Obert R., Panning, Eric M., Pollentier, I., Tirumala Venkata, A., Gronheid, R.

Year:

2014

Language:

english

File:

PDF, 522 KB

english, 2014

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - EUV lithography imaging using novel pellicle membranes

Panning, Eric M., Goldberg, Kenneth A., Pollentier, Ivan, Vanpaemel, Johannes, Lee, Jae Uk, Adelmann, Christoph, Zahedmanesh, Houman, Huyghebaert, Cedric, Gallagher, Emily E.

Year:

2016

Language:

english

File:

PDF, 5.51 MB

english, 2016

4

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Top coat or no top coat for immersion lithography?

Stepanenko, N., Lin, Qinghuang, Kim, Hyun-Woo, Kishimura, S., Van Den Heuvel, D., Vandenbroeck, N., Kocsis, M., Foubert, P., Maenhoudt, M., Ercken, M., Van Roey, F., Gronheid, R., Pollentier, I., Vang

Year:

2006

Language:

english

File:

PDF, 498 KB

english, 2006

5

Integration of Cu and low-k dielectrics: effect of hard mask and dry etch on electrical performance of damascene structures

R.A. Donaton, B. Coenegrachts, M. Maenhoudt, I. Pollentier, H. Struyf, S. Vanhaelemeersch, I. Vos, M. Meuris, W. Fyen, G. Beyer, Z. Tokei, M. Stucchi, I. Vervoort, D. De Roest, K. Maex

Journal:

Microelectronic Engineering

Year:

2001

Language:

english

File:

PDF, 857 KB

english, 2001

6

An item response analysis of the international restless legs syndrome study group rating scale for restless legs syndrome

Glen R. Wunderlich, Kenneth R. Evans, Terrence Sills, Stephane Pollentier, Juergen Reess, Richard P. Allen, Wayne Hening, Arthur S. Walters, The International Restless Legs Syndrome Study Group

Journal:

Year:

2005

Language:

english

File:

PDF, 226 KB

english, 2005

7

Increased serotonin after a suicide attempt: Coincidence or catharsis?

Peter Bräunig, Stefan Pollentier, Marie Luise Rao

Journal:

Biological Psychiatry

Year:

1988

Language:

english

File:

PDF, 258 KB

english, 1988

8

Fabrication of a GaAs-AlGaAs GRIN-SCH SQW laser diode on silicon by epitaxial lift-off

Pollentier, I., Buydens, L., Van Daele, P., Demeester, P.

Journal:

IEEE Photonics Technology Letters

Year:

1991

Language:

english

File:

PDF, 304 KB

english, 1991

9

SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] Lithography for Semiconductor Manufacturing II - Lithography aspects of dual-damascene interconnect technology

Maenhoudt, Mireille, Van Goidsenhoven, Diziana, Pollentier, Ivan K., Ronse, Kurt G., Lepage, Muriel, Struyf, Herbert, Van Hove, Marleen, Mack, Chris A., Stevenson, Tom

Year:

2001

Language:

english

File:

PDF, 1.09 MB

english, 2001

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Assessment of resist outgassing related EUV optics contamination for CAR and non-CAR material chemistries

Allen, Robert D., Pollentier, I., Neira, I., Somervell, Mark H., Gronheid, R.

Year:

2011

Language:

english

File:

PDF, 563 KB

english, 2011

11

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Properties and performance of EUVL pellicle membranes

Hayashi, Naoya, Kasprowicz, Bryan S., Gallagher, Emily E., Vanpaemel, Johannes, Pollentier, Ivan, Zahedmanesh, Houman, Adelmann, Christoph, Huyghebaert, Cedric, Jonckheere, Rik, Lee, Jae Uk

Year:

2015

Language:

english

File:

PDF, 594 KB

english, 2015

12

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Patterning development in spin-on hard mask systems for 30nm half-pitch EUV technology

Truffert, Vincent, Pollentier, Ivan, Foubert, Philippe, Lazzarino, Frederic, Anno, Yuusuke, Wilson, Christopher J., Ercken, Monique, Gronheid, Roel, Demuynck, Steven, Buch, Xavier, Somervell, Mark H.,

Year:

2012

Language:

english

File:

PDF, 1.95 MB

english, 2012

13

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Unraveling the effect of resist composition on EUV optics contamination

Pollentier, I., La Fontaine, Bruno M., Naulleau, Patrick P., Neira, I., Goethals, A.-M., Gronheid, R., Tarutani, S., Tamaoki, H., Tsubaki, H., Takahashi, T.

Year:

2011

Language:

english

File:

PDF, 415 KB

english, 2011

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Characterization of EUV optics contamination due to photoresist related outgassing

La Fontaine, Bruno M., Pollentier, I., Goethals, A.-M., Gronheid, R., Steinhoff, J., Van Dijk, J.

Year:

2010

Language:

english

File:

PDF, 633 KB

english, 2010

15

EUV Resist Process Performance Investigations on the NXE3100 Full Field Scanner

Goethals, Anne-Marie, Foubert, Philippe, Hosokawa, Kohei, Roey, Frieda Van, Niroomand, Ardavan, Heuvel, Dieter Van den, Pollentier, Ivan

Journal:

Journal of Photopolymer Science and Technology

Year:

2012

Language:

english

File:

PDF, 1.43 MB

english, 2012

16

Photoresist Absorption Measurement at Extreme Ultraviolet (EUV) Wavelength by Thin Film Transmission Method

Shehzad, Atif, Vesters, Yannick, Simone, Danilo De, Pollentier, Ivan, Nannarone, Stefano, Vandenberghe, Geert, De Gendt, Stefan

Journal:

Journal of Photopolymer Science and Technology

Year:

2019

Language:

english

File:

PDF, 1.58 MB

english, 2019

17

Low stress Pd/Ge-based ohmic contacts for GaAs epitaxial-lift-off

I. Pollentier, Y. Zhu, B. De Meulemeester, P. Van Daele, P. Demeester

Journal:

Microelectronic Engineering

Year:

1991

Language:

english

File:

PDF, 195 KB

english, 1991

18

Heteroepitaxial or epitaxial lift-off approach for future optoelectronic GaAs MESFET/InP optical switch integration ?

I. Pollentier, L. Buydens, P. Van Daele, P. Demeester

Journal:

Microelectronic Engineering

Year:

1992

Language:

english

File:

PDF, 264 KB

english, 1992

19

Recent developments in relaxed and strained lattice mismatched heterostructures

P. Demeester, G. Coudenys, L. Buydens, A. Ackaert, I. Moerman, I. Pollentier, P. van Daele

Journal:

Materials Science and Engineering: B

Year:

1991

Language:

english

File:

PDF, 755 KB

english, 1991

20

Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists

Kirsten Lawrie, Idriss Blakey, James Blinco, Roel Gronheid, Kevin Jack, Ivan Pollentier, Michael J. Leeson, Todd R. Younkin, Andrew K. Whittaker

Journal:

Radiation Physics and Chemistry

Year:

2011

Language:

english

File:

PDF, 435 KB

english, 2011

21

Measurements on the magnetic susceptibilities of Ag-Mn and Cu-Mn alloys

A. Van Itterbeek, R. Pollentier, W. Peelaers

Journal:

Applied Scientific Research

Year:

1957

Language:

english

File:

PDF, 260 KB

english, 1957

22

Measurements on the magnetic susceptibilities of Ag-Mn and Cu-Mn alloys

A. Van Itterbeek, R. Pollentier, W. Peelaers

Journal:

Applied Scientific Research, Section B

Year:

1959

Language:

english

File:

PDF, 252 KB

english, 1959

23

Relaxed lattice-mismatched growth of III–V semiconductors

P. Demeester, A. Ackaert, G. Coudenys, I. Moerman, L. Buydens, I. Pollentier, P. Van Daele

Journal:

Progress in Crystal Growth and Characterization of Materials

Year:

1991

Language:

english

File:

PDF, 4.33 MB

english, 1991

24

Pharmacology of Flibanserin

Franco Borsini, Kennett Evans, Kathryn Jason, Frank Rohde, Barbara Alexander, Stephan Pollentier

Journal:

CNS Drug Reviews

Year:

2002

Language:

english

File:

PDF, 188 KB

english, 2002

25

Spatial and temporal trends in nutrient concentrations in the Belgian Continental area of the North Sea during the period 1993–2000

Sandra De Galan, Marc Elskens, Leo Goeyens, André Pollentier, Natacha Brion, Willy Baeyens

Journal:

Estuarine, Coastal and Shelf Science

Year:

2004

Language:

english

File:

PDF, 438 KB

english, 2004

26

GaAs/AlGaAs multiple-quantum-well vertical optical modulators on glass using the epitaxial lift-off technique

Buydens, L., De Dobbelaere, P., Demeester, P., Pollentier, I., Van Daele, P.

Journal:

Year:

1991

Language:

english

File:

PDF, 505 KB

english, 1991

27

The scope of chiropractic practice: A survey of chiropractors in the UK

Aranka Pollentier, Jennifer M. Langworthy

Journal:

Clinical Chiropractic

Year:

2007

Language:

english

File:

PDF, 148 KB

english, 2007

28

Calcitonin Gene–Related Peptide Receptor Antagonist BIBN 4096 BS for the Acute Treatment of Migraine

Olesen, Jes, Diener, Hans-Christoph, Husstedt, Ingo W., Goadsby, Peter J., Hall, David, Meier, Ulrich, Pollentier, Stephane, Lesko, Lynna M.

Journal:

Boston Medical and Surgical Journal

Year:

2004

Language:

english

File:

PDF, 110 KB

english, 2004

29

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Status of ArF lithography for the 130-nm technology node

Ronse, Kurt G., Vandenberghe, Geert, Jaenen, Patrick, Delvaux, Christie, Vangoidsenhoven, Diziana, Van Roey, Frieda, Pollers, Ingrid, Maenhoudt, Mireille, Goethals, Anne-Marie, Pollentier, Ivan K., Vl

Year:

2000

Language:

english

File:

PDF, 4.27 MB

english, 2000

30

Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers

Lawrie, Kirsten J., Blakey, Idriss, Blinco, James P., Cheng, Han Hao, Gronheid, Roel, Jack, Kevin S., Pollentier, Ivan, Leeson, Michael J., Younkin, Todd R., Whittaker, Andrew K.

Journal:

Journal of Materials Chemistry

Year:

2011

Language:

english

File:

PDF, 326 KB

english, 2011

31

[IEEE IEEE International Electron Devices Meeting - San Francisco, CA, USA (8-11 Dec. 2002)] Digest. International Electron Devices Meeting, - Line edge roughness: characterization, modeling and impact on device behavior

Croon, J.A., Storms, G., Winkelmeier, S., Pollentier, I., Ercken, M., Decoutere, S., Sansen, W., Maes, H.E.

Year:

2002

Language:

english

File:

PDF, 277 KB

english, 2002

32

[IEEE IEEE 2000 International Interconnect Technology Conference - Burlingame, CA, USA (5-7 June 2000)] Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407) - Lithography as a critical step for low-k dual damascene: from 248 nm to 193 nm

Ronse, K., Maenhoudt, M., Pollentier, I., Wiaux, V., Struyf, H., Lepage, M., Vanhaelemeersch, S.

Year:

2000

Language:

english

File:

PDF, 281 KB

english, 2000

33

[IEEE 1993 (5th) International Conference on Indium Phosphide and Related Materials - Paris, France (19-22 April 1993)] 1993 (5th) International Conference on Indium Phosphide and Related Materials - Epitaxially lifted-off GaAs MESFETs on InP for optoelectronic integration

Pollentier, I., Brys, C., Debie, P., Coppoolse, R., Martens, L., Vandewege, J., Van Daele, P., Demeester, P.

Year:

1993

Language:

english

File:

PDF, 313 KB

english, 1993

34

[IEEE Summer Topical Meeting Digest on Broadband Analog and Digital Optoelectronics, Optical Multiple Access Networks, Integrated Optoelectronics, Smart Pixels - Santa Barbara, CA, USA (29 July-12 Aug. 1992)] Summer Topical Meeting Digest on Broadband Analog and Digital Optoelectronics, Optical Multiple Access Networks, Integrated Optoelectronics, Smart Pixels - Optimization And Reliability Of Epitaxial Lift-off For OEIC Fabrication

Pollentier, I., Demeester, P., Van Daele, P., Martens, L.

Year:

1992

File:

PDF, 168 KB

1992

35

[IEEE Third International Conference Indium Phosphide and Related Materials - Cardiff, UK (8-11 April 1991)] [Proceedings 1991] Third International Conference Indium Phosphide and Related Materials - Fabrication of long wavelength QEICs using GaAs on InP epitaxial lift-off technology

Pollentier, I., Demeester, P., Van Daele, P., Rondi, D., Glastre, G., Enard, A., Blondeau, R.

Year:

1991

Language:

english

File:

PDF, 384 KB

english, 1991

36

[IEEE ISSM 2005, IEEE International Symposium on Semiconductor Manufacturing, 2005. - San Jose, CA, USA (2005.09.13-2005.09.15)] ISSM 2005, IEEE International Symposium on Semiconductor Manufacturing, 2005. - CD SEM calibration to TEM for accurate metrology of fins in MuGFET devices

Lorusso, G.F., Collaert, N., Rooyackers, R., Ercken, M., Pollentier, I., Cheng, S., Degroote, B., Jurczak, M., Biesemans, S., Richard, O., Bender, H., Azordegan, A., Kuppa, R., Shirke, S., Prochazka,

Year:

2005

Language:

english

File:

PDF, 378 KB

english, 2005

37

Eastern wild turkey demography: Sensitivity of vital rates between landscapes

Pollentier, Christopher D., Hull, Scott D., Lutz, R. Scott

Journal:

Journal of Wildlife Management

Year:

2014

Language:

english

File:

PDF, 338 KB

english, 2014

38

High throughput grating qualification of directed self-assembly patterns using optical metrology

Van Look, Lieve, Rincon Delgadillo, Paulina, Lee, Yu-tsung, Pollentier, Ivan, Gronheid, Roel, Cao, Yi, Lin, Guanyang, Nealey, Paul F.

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 1.22 MB

english, 2014

39

Survival and productivity of eastern wild turkey females in contrasting landscapes in Wisconsin

Pollentier, Christopher D., Lutz, R. Scott, Hull, Scott D.

Journal:

Journal of Wildlife Management

Year:

2014

Language:

english

File:

PDF, 597 KB

english, 2014

40

Epitaxial lift-off and its applications

Demeester, P, Pollentier, I, Dobbelaere, P De, Brys, C, Daele, P Van

Journal:

Semiconductor Science and Technology

Year:

1993

Language:

english

File:

PDF, 1.31 MB

english, 1993

41

[IEEE ESSDERC 2003. 33rd European Solid-State Device Research - ESSDERC '03 - Estoril, Portugal (16-18 Sept. 2003)] Electrical Performance of Electrical Packaging (IEEE Cat. No. 03TH8710) - Gate isolation technology for compact poly-CMP embedded flash memories

Slotboom, M., Goarin, P., Akil, N., van Duuren, M., Demand, M., Wouters, J.M.D., Beckx, S., Leray, P., Baertsb, C., Baerts, C., Heylen, N., Pollentier, I.

Year:

2003

Language:

english

File:

PDF, 316 KB

english, 2003

42

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Effects of different processing conditions on line-edge roughness for 193-nm and 157-nm resists

Ercken, Monique, Leunissen, Leonardus H. A., Pollentier, Ivan, Patsis, George P., Constantoudis, Vassilios, Gogolides, Evangelos, Silver, Richard M.

Year:

2004

Language:

english

File:

PDF, 446 KB

english, 2004

43

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Comprehensive approach to MuGFET metrology

Lorusso, G. F., Leray, P., Vandeweyer, T., Ercken, M., Delvaux, C., Pollentier, I., Cheng, S., Collaert, N., Rooyackers, R., Degroote, B., Jurczak, M., Biesemans, S., Richard, O., Bender, H., Azordega

Year:

2006

Language:

english

File:

PDF, 583 KB

english, 2006

44

Montaigne's 'Patron Au-Dedans' and Virginia Woolf's Conception of the Modern Patron

Journal:

Notes and Queries

Year:

2008

Language:

english

File:

PDF, 94 KB

english, 2008

45

Epitaxial lift-off GaAs LEDs to Si for fabrication of opto-electronic integrated circuits

Pollentier, I., Demeester, P., Ackaert, A., Buydens, L., Van Daele, P., Baets, R.

Journal:

Electronics Letters

Year:

1990

Language:

english

File:

PDF, 231 KB

english, 1990

46

SPIE Proceedings [SPIE Physical Concepts of Materials for Novel Optoelectronic Device Applications - Aachen, Federal Republic of Germany (Sunday 28 October 1990)] Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization - Fabrication of high-radiance LEDs by epitaxial lift-off

Pollentier, Ivan K., Ackaert, Ann, De Dobbelaere, Peter M., Buydens, Luc, Van Daele, Peter, Demeester, Piet M. A., Razeghi, Manijeh

Year:

1991

Language:

english

File:

PDF, 444 KB

english, 1991

47

Integration of GaAs MESFETs and lithium niobate optical switches using epitaxial lift-off

O'Donnell, A.C., Pollentier, I., Demeester, P., Van Daele, P., Carr, A.D

Journal:

Electronics Letters

Year:

1990

Language:

english

File:

PDF, 806 KB

english, 1990

48

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Relationship between resist related outgassing and witness sample contamination in the NXE outgas qualification using electrons and EUV

Pollentier, I., Naulleau, Patrick P., Lokasani, R., Gronheid, R., Hill, S., Tarrio, C., Lucatorto, T.

Year:

2013

Language:

english

File:

PDF, 1.47 MB

english, 2013

49

Pramipexol: Präklinisches und klinisches Profil

Pollentier, S., Brecht, H. M.

Journal:

Aktuelle Neurologie

Year:

1998

File:

PDF, 258 KB

1998

50

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Innovative metrology for wafer edge defectivity in immersion lithography

Pollentier, I., Archie, Chas N., Iwamoto, F., Kocsis, M., Somanchi, A., Burkeen, F., Vedula, S.

Year:

2007

Language:

english

File:

PDF, 1.16 MB

english, 2007